GaN MOCVD and GaN HVPE, epitaxial growth of Si, SiGe,Ge, direct wafer bonding, Si film on glass or plastic, ZnO films, printing technology for TFT & solar cells, Si nanoparticles, silicide, dry etching, metallization for IC, TFT, solar cell, thermal imager, and sensor applications. Thin film processes and technology, characterization technology.
Research:
ZnO films and solution processes nanoparticles
Printing technology for TFT & solar cells
Low temperature processing of Si film from Si nanoparticles
HVPE and MOCVD of GaN
Achieve highest mobility of Si device on glass.
Direct wafer bonding and Si film on glass or plastic
Epitaxial growth of Si, SiGe,Ge
Development of Ge on Si for NIR photo detector.
Strained Si on relaxed SiGe for high mobility device.
Thin film processes: metallization, dry etching, silicide, epitaxial growth, diffusion barrier, device processing, thin film characterization.
In-situ electron microscope study of the nucleation and growth of thin film, now this technique becomes important for understanding self-assembly of nano structure.